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Advancements in Photolithography Techniques Sign in to save
Papers per year
Papers 44
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Key Role of Very Low Energy Electrons in Tin-Based Molecular Resists for Extreme Ultraviolet Nanolithography2020 ACS Applied Materials & Interfaces article Engineering Advancements in Photolithography Techniques Open access cited by 21 patents
Ivan Bespalov, Yu Zhang, Jarich Haitjema, Rudolf M. Tromp, Sense Jan van der Molen, Albert Manfred Brouwer, +2 more
113citations -
How to solve problems in micro- and nanofabrication caused by the emission of electrons and charged metal atoms during e-beam evaporation2021 Journal of Physics D Applied Physics article Engineering Advancements in Photolithography Techniques Open access
Frank Volmer, Inga Seidler, Timo Bißwanger, Jhih‐Sian Tu, Lars R. Schreiber, Christoph Stampfer, +1 more
29citations -
Quantitative characterization of absorber and phase defects on EUV reticles using coherent diffraction imaging2020 Journal of Micro/Nanopatterning Materials and Metrology article Engineering Advancements in Photolithography Techniques Open access
Iacopo Mochi, Ricarda Maria Nebling, Uldis Locāns, Rajeev Rajendran, Atoosa Dejkameh, Dimitrios Kazazis, +4 more
17citations -
Combined ultraviolet- and electron-beam lithography with Micro-Resist-Technology GmbH ma-N1400 resist2022 Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena article Engineering Advancements in Photolithography Techniques Open access
David J. Thoen, Vignesh Murugesan, Alejandro Pascual Laguna, K. Karatsu, Akira Endo, J. J. A. Baselmans
10citations -
Latent image characterization by spectroscopic reflectometry in the extreme ultraviolet2022 Journal of Micro/Nanopatterning Materials and Metrology article Engineering Advancements in Photolithography Techniques Open access
Sophia Schröder, Lukas Bahrenberg, Bernhard Lüttgenau, Sven Glabisch, Sascha Brose, Serhiy Danylyuk, +3 more
9citations -
Medusa 82—Hydrogen silsesquioxane based high sensitivity negative-tone resist with long shelf-life and grayscale lithography capability2021 Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena article Engineering Advancements in Photolithography Techniques
Mandy Grube, Benjamin Schille, Matthias Schirmer, Maik Gerngroß, Uwe Hübner, Paul Voigt, +1 more
6citations -
Latent image characterization by spectroscopic reflectometry in the extreme ultraviolet2021 Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV conference-paper Engineering Advancements in Photolithography Techniques Open access
Sophia Schröder, Lukas Bahrenberg, Bernhard Lüttgenau, Sven Glabisch, Serhiy Danylyuk, Sascha Brose, +2 more
5citations -
EUV scattering from carbon nanotube pellicles: measurement and control2021 Journal of Micro/Nanopatterning Materials and Metrology article Engineering Advancements in Photolithography Techniques
Ivan K. Pollentier, Marina Y. Timmermans, Cedric Huyghebaert, Steven Brems, Emily E. Gallagher, Bernhard Lüttgenau, +1 more
4citations
Most active Aachen authors
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Sascha Brose 277 citations overall21 papers
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Serhiy Danylyuk 998 citations overall19 papers
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Jochen Stollenwerk 1,789 citations overall14 papers
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Bernhard Lüttgenau 57 citations overall11 papers
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Peter Loosen 2,783 citations overall9 papers
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Sven Glabisch 66 citations overall9 papers
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Sophia Schröder 50 citations overall9 papers
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Carlo Holly 421 citations overall8 papers
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Lukas Bahrenberg 73 citations overall7 papers
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Klaus Bergmann 1,156 citations overall5 papers
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Joachim Knoch 8,248 citations overall3 papers
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Larissa Juschkin 826 citations overall3 papers
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Jochen Vieker 44 citations overall3 papers
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Max C. Lemme 16,230 citations overall2 papers
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J. J. A. Baselmans 4,884 citations overall2 papers