Accuracy analysis of a stand-alone EUV spectrometer for the characterization of ultrathin films and nanoscale gratings

Abstract

In this contribution the accuracy of measurements performed with a stand-alone EUV spectrometer is analyzed. The setup is used to determine optical constants and dimensional characteristics of samples, e.g. ultrathin films or nanoscale gratings. For this purpose, measurements of the broadband EUV reflectance of the samples at variable grazing incidence angles are used to reconstruct sample parameters in a model-based approach. The accuracy of these measurements is a crucial factor for a reliable characterization of samples. We present an overview on the sources of uncertainties in the experimental setup as well as improvements to the setup that improves its accuracy. Additionally, the reconstruction accuracy of the optical constants is analyzed. A focus is put on the influence of the experimental uncertainty and the range of incidence angles used for reflectance measurements.

Authors 8

1. Sophia Schroeder Aachen

   RWTH Aachen University · Jülich Aachen Research Alliance

   Affiliation as printed

   JARA - Fundamentals of Future Information Technology (Germany)

   RWTH Aachen Univ. (Germany)

2. Lukas Bahrenberg Aachen

   RWTH Aachen University · Jülich Aachen Research Alliance

   Affiliation as printed

   JARA - Fundamentals of Future Information Technology (Germany)

   RWTH Aachen Univ. (Germany)

3. Nimet Kutay Eryilmaz Aachen

   RWTH Aachen University · Jülich Aachen Research Alliance

   Affiliation as printed

   JARA - Fundamentals of Future Information Technology (Germany)

   RWTH Aachen Univ. (Germany)

4. Sven Glabisch Aachen

   RWTH Aachen University · Jülich Aachen Research Alliance

   Affiliation as printed

   JARA - Fundamentals of Future Information Technology (Germany)

   RWTH Aachen Univ. (Germany)

5. Serhiy Danylyuk Aachen Fraunhofer-Institut für Lasertechnik ILT

   Fraunhofer Institute for Laser Technology

   Affiliation as printed

   Fraunhofer-Institut für Lasertechnik ILT (Germany)

6. Sascha Brose Aachen

   RWTH Aachen University · Jülich Aachen Research Alliance

   Affiliation as printed

   JARA - Fundamentals of Future Information Technology (Germany)

   RWTH Aachen Univ. (Germany)

7. Jochen Stollenwerk Aachen Fraunhofer-Institut für Lasertechnik ILT

   RWTH Aachen University · Fraunhofer Institute for Laser Technology · Jülich Aachen Research Alliance

   Affiliation as printed

   Fraunhofer-Institut für Lasertechnik ILT (Germany)

   JARA - Fundamentals of Future Information Technology (Germany)

   RWTH Aachen Univ. (Germany)

8. Peter Loosen Aachen Fraunhofer-Institut für Lasertechnik ILT

   RWTH Aachen University · Fraunhofer Institute for Laser Technology · Jülich Aachen Research Alliance

   Affiliation as printed

   Fraunhofer-Institut für Lasertechnik ILT (Germany)

   JARA - Fundamentals of Future Information Technology (Germany)

   RWTH Aachen Univ. (Germany)