Latent image characterization by spectroscopic reflectometry in the extreme ultraviolet

Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV, pp. 50

Abstract

The authors present latent image characterization in photoresists by means of extreme ultraviolet (EUV) spectroscopic reflectometry. The optical constants of photoresists before and after exposure are measured in the EUV spectral range. Latent images are investigated in the form of periodic line gratings. The investigation is performed by the analysis of spectroscopic reflectance curves in the wavelength range from 5 nm to 20 nm at grazing incidence angles. Through an analysis of the reflectance curves based on rigorous electromagnetic modeling, a characterization of parameters of interest of the latent image is evaluated. This includes the latent image profile, surface topography and stochastic-related parameters such as line edge roughness.

Authors 8

1. Sophia Schröder Aachen

   Jülich Aachen Research Alliance · RWTH Aachen University

   Affiliation as printed

   JARA - Fundamentals of Future Information Technology (Germany)

   RWTH Aachen Univ. (Germany)

2. Lukas Bahrenberg Aachen

   Jülich Aachen Research Alliance · RWTH Aachen University

   Affiliation as printed

   JARA - Fundamentals of Future Information Technology (Germany)

   RWTH Aachen Univ. (Germany)

3. Bernhard Lüttgenau Aachen

   Jülich Aachen Research Alliance · RWTH Aachen University

   Affiliation as printed

   JARA - Fundamentals of Future Information Technology (Germany)

   RWTH Aachen Univ. (Germany)

4. Sven Glabisch Aachen

   Jülich Aachen Research Alliance · RWTH Aachen University

   Affiliation as printed

   JARA - Fundamentals of Future Information Technology (Germany)

   RWTH Aachen Univ. (Germany)

5. Serhiy Danylyuk Aachen Fraunhofer ILT

   Fraunhofer Institute for Laser Technology

   Affiliation as printed

   Fraunhofer ILT (Germany)

6. Sascha Brose Aachen

   Jülich Aachen Research Alliance · RWTH Aachen University

   Affiliation as printed

   JARA - Fundamentals of Future Information Technology (Germany)

   RWTH Aachen Univ. (Germany)

7. Jochen Stollenwerk Aachen Fraunhofer ILT

   Fraunhofer Institute for Laser Technology · Jülich Aachen Research Alliance · RWTH Aachen University

   Affiliation as printed

   Fraunhofer ILT (Germany)

   JARA - Fundamentals of Future Information Technology (Germany)

   RWTH Aachen Univ. (Germany)

8. Peter Loosen Aachen Fraunhofer ILT

   Fraunhofer Institute for Laser Technology · Jülich Aachen Research Alliance · RWTH Aachen University

   Affiliation as printed

   Fraunhofer ILT (Germany)

   JARA - Fundamentals of Future Information Technology (Germany)

   RWTH Aachen Univ. (Germany)