Computational proximity lithography with extreme ultraviolet radiation

Optics Express, vol. 28, pp. 27000

Abstract

The potential of extreme ultraviolet (EUV) computational proximity lithography for fabrication of arbitrary nanoscale patterns is investigated. We propose to use a holographic mask (attenuating phase shifting mask) consisting of structures of two phase levels. This approach allows printing of arbitrary, non-periodic structures without using high-resolution imaging optics. The holographic mask is designed for a wavelength of 13.5 nm with a conventional high-resolution electron beam resist as the phase shifting medium (pixel size 50 nm). The imaging performance is evaluated by using EUV radiation with different degrees of spatial coherence. Therefore exposures on identical masks are carried out with both undulator radiation at a synchrotron facility and plasma-based radiation at a laboratory setup.

Authors 9

1. Valerie Deuter

   Forschungszentrum Jülich

   Affiliation as printed

   Peter Grünberg Institute-10, Forschungszentrum Jülich, Wilhelm-Johnen Str. 1, 52425 Jülich, Germany

2. Maciej Grochowicz Aachen Experimental Physics of EUV

   RWTH Aachen University

   Affiliation as printed

   Experimental Physics of EUV, RWTH Aachen University EUV, Steinbachstr. 15, 52074 Aachen, Germany

3. Sascha Brose

   Jülich Aachen Research Alliance

   Affiliation as printed

   JARA - Fundamentals of Future Information Technology, Wilhelm-Johnen Str. 1, 52425 Jülich, Germany

4. Jan Biller Aachen Experimental Physics of EUV

   RWTH Aachen University

   Affiliation as printed

   Experimental Physics of EUV, RWTH Aachen University EUV, Steinbachstr. 15, 52074 Aachen, Germany

5. Serhiy Danylyuk Aachen Fraunhofer ILT—Institute for Laser Technology

   Fraunhofer Institute for Laser Technology

   Affiliation as printed

   Fraunhofer ILT - Institute for Laser Technology, Steinbachstr. 15, 52074 Aachen, Germany

6. Thomas Taubner Aachen Institute of Physics (IA)

   RWTH Aachen University

   Affiliation as printed

   Institute of Physics (IA), RWTH Aachen University, Otto-Blumenthal-Str., 52074 Aachen, Germany

7. Agnieszka Siemion

   Warsaw University of Technology

   Affiliation as printed

   Faculty of Physics, WUT Warsaw University of Technology, Koszykowa 75, 00-662 Warsaw, Poland

8. Detlev Grützmacher

   Forschungszentrum Jülich

   Affiliation as printed

   Peter Grünberg Institute-10, Forschungszentrum Jülich, Wilhelm-Johnen Str. 1, 52425 Jülich, Germany

9. Larissa Juschkin Aachen Experimental Physics of EUV

   RWTH Aachen University

   Affiliation as printed

   Experimental Physics of EUV, RWTH Aachen University EUV, Steinbachstr. 15, 52074 Aachen, Germany