Developments in Mask-Free Singularly Addressable Nano-LED Lithography

Nanomanufacturing, vol. 4, pp. 99–110

Abstract

LED devices are increasingly gaining importance in lithography approaches due to the fact that they can be used flexibly for mask-less patterning. In this study, we briefly report on developments in mask-free lithography approaches based on nano-LED devices and summarize our current achievements in the different building blocks needed for its application. Individually addressable nano-LED structures can form the basis for an unprecedented fast and flexible patterning, on demand, in photo-chemically sensitive films. We introduce a driving scheme for nano-LEDs in arrays serving for a singularly addressable approach. Furthermore, we discuss the challenges facing nano-LED fabrication and possibilities to improve their performance. Additionally, we introduce LED structures based on a hybrid nanocrystal/nano-LED approach. Lastly, we provide an outlook how this approach could further develop for next generation lithography systems. This technique has a huge potential to revolutionize the field and to contribute significantly to energy and resources saving device nanomanufacturing.

Authors 4

1. M. Mikulics corresponding

   Forschungszentrum Jülich · Ernst Ruska Centre · Jülich Aachen Research Alliance

   Affiliation as printed

   Ernst-Ruska-Centre (ER-C-2), Forschungszentrum Jülich, 52425 Jülich, Germany

   Jülich-Aachen Research Alliance (JARA), Fundamentals of Future Information Technology, 52425 Jülich, Germany

2. Andreas Winden

   Robert Bosch (Germany)

   Affiliation as printed

   Robert Bosch GmbH, 72760 Reutlingen, Germany

3. Joachim Mayer Aachen Central Facility for Electron Microscopy

   Forschungszentrum Jülich · Ernst Ruska Centre · Jülich Aachen Research Alliance · RWTH Aachen University

   Affiliation as printed

   Central Facility for Electron Microscopy (GFE), RWTH Aachen University, 52074 Aachen, Germany

   Ernst-Ruska-Centre (ER-C-2), Forschungszentrum Jülich, 52425 Jülich, Germany

   Jülich-Aachen Research Alliance (JARA), Fundamentals of Future Information Technology, 52425 Jülich, Germany

4. Hilde Helen Hardtdegen corresponding

   Forschungszentrum Jülich · Ernst Ruska Centre · Jülich Aachen Research Alliance

   Affiliation as printed

   Ernst-Ruska-Centre (ER-C-2), Forschungszentrum Jülich, 52425 Jülich, Germany

   Jülich-Aachen Research Alliance (JARA), Fundamentals of Future Information Technology, 52425 Jülich, Germany