Topics › Physical Sciences › Engineering › Electrical and Electronic Engineering
Advancements in Photolithography Techniques Sign in to save
Papers per year
Papers 44
Open in paper search →-
Design and realization of an in-lab EUV dual beamline for industrial and scientific applications2021 International Conference on Extreme Ultraviolet Lithography conference-paper Engineering Advancements in Photolithography Techniques
Bernhard Lüttgenau, Sascha Brose, Serhiy Danylyuk, Jochen Stollenwerk, Peter Loosen, Carlo Holly
3citations -
Fabrication of gate electrodes for scalable quantum computing using CMOS industry compatible e-beam lithography and numerical simulation of the resulting quantum device2023 European Mask and Lithography Conference (EMLC) conference-paper Engineering Advancements in Photolithography Techniques
Varvara Brackmann, Malte Neul, W. Langheinrich, Maik Simon, Pascal Muster, Sebastian Pregl, +11 more
2citations -
High-precision optical constant characterization of materials in the EUV spectral range: from large research facilities to laboratory-based instruments2022 European Mask and Lithography Conference (EMLC) conference-paper Engineering Advancements in Photolithography Techniques
Victor Soltwisch, Sven Glabisch, Anna Andrle, Vicky Philipsen, Qais Saadeh, Sophia Schröder, +3 more
2citations -
Investigation of the resolution limit of Talbot lithography with compact EUV exposure tools2023 European Mask and Lithography Conference (EMLC) conference-paper Engineering Advancements in Photolithography Techniques
Bernhard Lüttgenau, Sascha Brose, Serhiy Danylyuk, Jochen Stollenwerk, Carlo Holly
2citations -
Investigation of stochastic roughness effects for nanoscale grating characterization with a stand-alone EUV spectrometer2022 SPIE Photomask Technology Conference conference-paper Engineering Advancements in Photolithography Techniques
Sven Glabisch, Sophia Schröder, Sascha Brose, Henning Heiming, Jochen Stollenwerk, Carlo Holly
1citations -
Development of an ultra-compact inline transmission grating spectrograph for extreme ultraviolet wavelengths2023 International Conference on Extreme Ultraviolet Lithography conference-paper Engineering Advancements in Photolithography Techniques
Sascha Brose, Serhiy Danylyuk, Bernhard Lüttgenau, Ismael Gisch, Lars Lohmann, Jochen Stollenwerk, +1 more
1citations -
Broadband scatterometry at extreme ultraviolet wavelengths for nanograting characterization2021 Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV conference-paper Engineering Advancements in Photolithography Techniques
Seyed moein Ghafoori, Lukas Bahrenberg, Sven Glabisch, Sophia Schroeder, Serhiy Danylyuk, Sascha Brose, +3 more
1citations -
Towards the resolution limit of Talbot lithography with compact EUV exposure tools2022 International Conference on Extreme Ultraviolet Lithography conference-paper Engineering Advancements in Photolithography Techniques
Bernhard Lüttgenau, Sascha Brose, Serhiy Danylyuk, Jochen Stollenwerk, Carlo Holly
1citations
Most active Aachen authors
-
Sascha Brose 277 citations overall21 papers
-
Serhiy Danylyuk 998 citations overall19 papers
-
Jochen Stollenwerk 1,789 citations overall14 papers
-
Bernhard Lüttgenau 57 citations overall11 papers
-
Peter Loosen 2,783 citations overall9 papers
-
Sven Glabisch 66 citations overall9 papers
-
Sophia Schröder 50 citations overall9 papers
-
Carlo Holly 421 citations overall8 papers
-
Lukas Bahrenberg 73 citations overall7 papers
-
Klaus Bergmann 1,156 citations overall5 papers
-
Joachim Knoch 8,248 citations overall3 papers
-
Larissa Juschkin 826 citations overall3 papers
-
Jochen Vieker 44 citations overall3 papers
-
Max C. Lemme 16,230 citations overall2 papers
-
J. J. A. Baselmans 4,884 citations overall2 papers