February 25, 2015 article Multi‐angle spectroscopic extreme ultraviolet reflectometry for analysis of thin films and interfaces Physica status solidi. C, Conferences and critical reviews/Physica status solidi. C, Current topics in solid state physics DOI: 10.1002/pssc.201400117 OpenAlex Authors 0 Author list not loaded yet. Cited by 7 stored of 13 Search Sort Most cited Newest Oldest Patent citations Title Any typearticle review book-chapter conference-paper preprint dissertation book dataset other Any fieldAgricultural and Biological Sciences Arts and Humanities Biochemistry, Genetics and Molecular Biology Business, Management and Accounting Chemical Engineering Chemistry Computer Science Decision Sciences Dentistry Earth and Planetary Sciences Economics, Econometrics and Finance Energy Engineering Environmental Science Health Professions Immunology and Microbiology Materials Science Mathematics Medicine Neuroscience Nursing Pharmacology, Toxicology and Pharmaceutics Physics and Astronomy Psychology Social Sciences Veterinary Open access Instrumentation and uncertainty evaluation for absolute characterization of thin films and nanostructured surfaces in advanced optical metrology 2025 Metrologia article Decision Sciences Scientific Measurement and Uncertainty Evaluation Open access 5 citations EUV Measurement Technologies 2023 RWTHedition book-chapter Engineering Advancements in Photolithography Techniques 0 citations Extreme Ultraviolet Radiation Sources from Dense Plasmas 2023 Atoms article Physics and Astronomy Atomic and Molecular Physics Open access 4 citations Nanoscale grating characterization using EUV scatterometry and soft x-ray scattering with plasma and synchrotron radiation 2022 Applied Optics article Engineering Advancements in Photolithography Techniques 12 citations Latent image characterization by spectroscopic reflectometry in the extreme ultraviolet 2022 Journal of Micro/Nanopatterning Materials and Metrology article Engineering Advancements in Photolithography Techniques Open access 9 citations Accuracy analysis of a stand-alone EUV spectrometer for the characterization of ultrathin films and nanoscale gratings 2020 conference-paper Engineering Advancements in Photolithography Techniques 5 citations Characterization of nanoscale gratings by spectroscopic reflectometry in the extreme ultraviolet with a stand-alone setup 2020 Optics Express article Engineering Advancements in Photolithography Techniques Open access 16 citations 7 results References 0