September 01, 1999 article Highly repetitive, extreme-ultraviolet radiation source based on a gas-discharge plasma Applied Optics DOI: 10.1364/ao.38.005413 OpenAlex Authors 0 Author list not loaded yet. Cited by 9 stored of 99 Search Sort Most cited Newest Oldest Patent citations Title Any typearticle review book-chapter conference-paper preprint dissertation book dataset other Any fieldAgricultural and Biological Sciences Arts and Humanities Biochemistry, Genetics and Molecular Biology Business, Management and Accounting Chemical Engineering Chemistry Computer Science Decision Sciences Dentistry Earth and Planetary Sciences Economics, Econometrics and Finance Energy Engineering Environmental Science Health Professions Immunology and Microbiology Materials Science Mathematics Medicine Neuroscience Nursing Pharmacology, Toxicology and Pharmaceutics Physics and Astronomy Psychology Social Sciences Veterinary Open access Instrumentation and uncertainty evaluation for absolute characterization of thin films and nanostructured surfaces in advanced optical metrology 2025 Metrologia article Decision Sciences Scientific Measurement and Uncertainty Evaluation Open access 5 citations Pulsed Plasma EUV Sources 2023 RWTHedition book-chapter Engineering Advancements in Photolithography Techniques 0 citations EUV Measurement Technologies 2023 RWTHedition book-chapter Engineering Advancements in Photolithography Techniques 0 citations Nanoscale grating characterization using EUV scatterometry and soft x-ray scattering with plasma and synchrotron radiation 2022 Applied Optics article Engineering Advancements in Photolithography Techniques 12 citations High-precision optical constant characterization of materials in the EUV spectral range: from large research facilities to laboratory-based instruments 2022 European Mask and Lithography Conference (EMLC) conference-paper Engineering Advancements in Photolithography Techniques 2 citations Latent image characterization by spectroscopic reflectometry in the extreme ultraviolet 2022 Journal of Micro/Nanopatterning Materials and Metrology article Engineering Advancements in Photolithography Techniques Open access 9 citations High speed imaging of Z-pinch gas discharge in extreme ultraviolet and model-based three-dimensional reconstruction of emitting volume 2022 Review of Scientific Instruments article Engineering Plasma Diagnostics and Applications 3 citations Accuracy analysis of a stand-alone EUV spectrometer for the characterization of ultrathin films and nanoscale gratings 2020 conference-paper Engineering Advancements in Photolithography Techniques 5 citations Characterization of nanoscale gratings by spectroscopic reflectometry in the extreme ultraviolet with a stand-alone setup 2020 Optics Express article Engineering Advancements in Photolithography Techniques Open access 16 citations 9 results References 0