January 25, 2013 article Open access Diffraction-assisted extreme ultraviolet proximity lithography for fabrication of nanophotonic arrays Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena DOI: 10.1116/1.4789445 Full text (OA) OpenAlex Authors 0 Author list not loaded yet. Cited by 3 stored of 17 Search Sort Most cited Newest Oldest Patent citations Title Any typearticle review book-chapter conference-paper preprint dissertation book dataset other Any fieldAgricultural and Biological Sciences Arts and Humanities Biochemistry, Genetics and Molecular Biology Business, Management and Accounting Chemical Engineering Chemistry Computer Science Decision Sciences Dentistry Earth and Planetary Sciences Economics, Econometrics and Finance Energy Engineering Environmental Science Health Professions Immunology and Microbiology Materials Science Mathematics Medicine Neuroscience Nursing Pharmacology, Toxicology and Pharmaceutics Physics and Astronomy Psychology Social Sciences Veterinary Open access Design and realization of an in-lab EUV dual beamline for industrial and scientific applications 2021 International Conference on Extreme Ultraviolet Lithography conference-paper Engineering Advancements in Photolithography Techniques 3 citations Design and realization of an industrial stand-alone EUV resist qualification setup 2020 conference-paper Engineering Advancements in Photolithography Techniques 2 citations Computational proximity lithography with extreme ultraviolet radiation 2020 Optics Express article Engineering Advancements in Photolithography Techniques Open access 6 citations 3 results References 0