June 24, 2014 article Open access Resolution enhancement for advanced mask aligner lithography using phase-shifting photomasks Optics Express DOI: 10.1364/oe.22.016310 Full text (OA) OpenAlex Authors 0 Author list not loaded yet. Cited by 1 stored of 40 Search Sort Most cited Newest Oldest Patent citations Title Any typearticle review book-chapter conference-paper preprint dissertation book dataset other Any fieldAgricultural and Biological Sciences Arts and Humanities Biochemistry, Genetics and Molecular Biology Business, Management and Accounting Chemical Engineering Chemistry Computer Science Decision Sciences Dentistry Earth and Planetary Sciences Economics, Econometrics and Finance Energy Engineering Environmental Science Health Professions Immunology and Microbiology Materials Science Mathematics Medicine Neuroscience Nursing Pharmacology, Toxicology and Pharmaceutics Physics and Astronomy Psychology Social Sciences Veterinary Open access Computational proximity lithography with extreme ultraviolet radiation 2020 Optics Express article Engineering Advancements in Photolithography Techniques Open access 6 citations 1 result References 0