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Achromatic Talbot lithography with partially coherent extreme ultraviolet radiation: mask and illumination parameter optimization2024 Journal of Micro/Nanopatterning Materials and Metrology article Engineering Advancements in Photolithography Techniques Open access
Bernhard Lüttgenau, Sascha Brose, Serhiy Danylyuk, Jochen Stollenwerk, Carlo Holly
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