Deviations between film and target compositions induced by backscattered Ar during sputtering from M2-Al-C (M = Cr, Zr, and Hf) composite targets

Surface and Coatings Technology, vol. 446, pp. 128764

Authors 8

1. Yu‐Ping Chien corresponding Aachen Materials Chemistry

   RWTH Aachen University

   Affiliation as printed

   Materials Chemistry, RWTH Aachen University, Kopernikusstr. 10, D-52074 Aachen, Germany

2. Stanislav Mráz Aachen Materials Chemistry

   RWTH Aachen University

   Affiliation as printed

   Materials Chemistry, RWTH Aachen University, Kopernikusstr. 10, D-52074 Aachen, Germany

3. Matej Fekete Aachen Materials Chemistry

   RWTH Aachen University

   Affiliation as printed

   Materials Chemistry, RWTH Aachen University, Kopernikusstr. 10, D-52074 Aachen, Germany

4. Marcus Hans Aachen Materials Chemistry

   RWTH Aachen University

   Affiliation as printed

   Materials Chemistry, RWTH Aachen University, Kopernikusstr. 10, D-52074 Aachen, Germany

5. Daniel Primetzhofer

   Uppsala University

   Affiliation as printed

   Department of Physics and Astronomy, Uppsala University, Lägerhyddsvägen 1, S-75120, Uppsala, Sweden

6. S. Kolozsvári

   Plansee (Germany)

   Affiliation as printed

   Plansee Composite Materials GmbH, Siebenbürgerstr. 23, D-86983 Lechbruck am See, Germany

7. Peter Polcik

   Plansee (Germany)

   Affiliation as printed

   Plansee Composite Materials GmbH, Siebenbürgerstr. 23, D-86983 Lechbruck am See, Germany

8. Jochen M. Schneider Aachen Materials Chemistry

   RWTH Aachen University

   Affiliation as printed

   Materials Chemistry, RWTH Aachen University, Kopernikusstr. 10, D-52074 Aachen, Germany