December 01, 2007 article Open access High power impulse magnetron sputtering: Current-voltage-time characteristics indicate the onset of sustained self-sputtering Journal of Applied Physics DOI: 10.1063/1.2817812 Full text (OA) OpenAlex Authors 0 Author list not loaded yet. Cited by 2 stored of 348 Search Sort Most cited Newest Oldest Patent citations Title Any typearticle review book-chapter conference-paper preprint dissertation book dataset other Any fieldAgricultural and Biological Sciences Arts and Humanities Biochemistry, Genetics and Molecular Biology Business, Management and Accounting Chemical Engineering Chemistry Computer Science Decision Sciences Dentistry Earth and Planetary Sciences Economics, Econometrics and Finance Energy Engineering Environmental Science Health Professions Immunology and Microbiology Materials Science Mathematics Medicine Neuroscience Nursing Pharmacology, Toxicology and Pharmaceutics Physics and Astronomy Psychology Social Sciences Veterinary Open access Angular distribution of titanium ions and neutrals in high-power impulse magnetron sputtering discharges 2023 Journal of Vacuum Science & Technology A Vacuum Surfaces and Films article Engineering Plasma Diagnostics and Applications Open access 19 citations Deviations between film and target compositions induced by backscattered Ar during sputtering from M2-Al-C (M = Cr, Zr, and Hf) composite targets 2022 Surface and Coatings Technology article Engineering Metal and Thin Film Mechanics 14 citations 2 results References 0