From

Institution

Field

Type

Open access only Cited by patents (Lens) Include non-Aachen papers (citing/cited)

Reset

Papers matching “multilayer mirrors” 7

Sort: Relevance Cited Newest Oldest Fwci Patents ⇩ CSV

Not finding it? Sign in to also search OpenAlex live.

Characterisation of engineered defects in extreme ultraviolet mirror substrates using lab-scale extreme ultraviolet reflection ptychography
2023 Ultramicroscopy article Physics and Astronomy Advanced X-ray Imaging Techniques Open access

Haoyan Lu, Michal Odstrčil, Charles Pooley, Jan Biller, Mikheil Mebonia, Guanze He, +4 more

15

citations
Design of an efficient illuminator for partially coherent sources in the extreme ultraviolet
2022 Applied Optics article Engineering Advancements in Photolithography Techniques Open access

Serhiy Danylyuk, Carlo Holly

4

citations
High-precision optical constant characterization of materials in the EUV spectral range: from large research facilities to laboratory-based instruments
2022 European Mask and Lithography Conference (EMLC) conference-paper Engineering Advancements in Photolithography Techniques

Victor Soltwisch, Sven Glabisch, Anna Andrle, Vicky Philipsen, Qais Saadeh, Sophia Schröder, +3 more

2

citations
Design and realization of an in-lab EUV dual beamline for industrial and scientific applications
2021 International Conference on Extreme Ultraviolet Lithography conference-paper Engineering Advancements in Photolithography Techniques

Bernhard Lüttgenau, Sascha Brose, Serhiy Danylyuk, Jochen Stollenwerk, Peter Loosen, Carlo Holly

3

citations
Design and realization of an industrial stand-alone EUV resist qualification setup
2020 conference-paper Engineering Advancements in Photolithography Techniques

Bernhard Lüttgenau, Sascha Brose, Seonghyeok Choi, Dieter Panitzek, Serhiy Danylyuk, Rainer Lebert, +2 more

2

citations
Mid-IR diffraction gratings fabricated via nanoimprint lithography for chirped pulse amplification
2026 Research Square preprint Materials Science Optical Coatings and Gratings Open access

Giovanna Capraro, Danish Bashir, Michael Möller, Florian Schlachter, Jens Bolten, Thomas Graf, +2 more

0

citations
A lab-scale EUV high-intensity exposure setup for small-spot exposures and angular-resolved photoelectron spectroscopy
2026 conference-paper

Linus Nagel, Adelind Elschani, Sarah Schreyer, Sven Glabisch, Sascha Brose, Serhiy Danylyuk, +2 more

0

citations

7 results