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Key Role of Very Low Energy Electrons in Tin-Based Molecular Resists for Extreme Ultraviolet Nanolithography2020 ACS Applied Materials & Interfaces article Engineering Advancements in Photolithography Techniques Open access cited by 21 patents
Ivan Bespalov, Yu Zhang, Jarich Haitjema, Rudolf M. Tromp, Sense Jan van der Molen, Albert Manfred Brouwer, +2 more
113citations