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Medusa 82—Hydrogen silsesquioxane based high sensitivity negative-tone resist with long shelf-life and grayscale lithography capability2021 Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena article Engineering Advancements in Photolithography Techniques
Mandy Grube, Benjamin Schille, Matthias Schirmer, Maik Gerngroß, Uwe Hübner, Paul Voigt, +1 more
6citations -
Latent image characterization by spectroscopic reflectometry in the extreme ultraviolet2022 Journal of Micro/Nanopatterning Materials and Metrology article Engineering Advancements in Photolithography Techniques Open access
Sophia Schröder, Lukas Bahrenberg, Bernhard Lüttgenau, Sven Glabisch, Sascha Brose, Serhiy Danylyuk, +3 more
9citations -
Achromatic Talbot lithography with partially coherent extreme ultraviolet radiation: mask and illumination parameter optimization2024 Journal of Micro/Nanopatterning Materials and Metrology article Engineering Advancements in Photolithography Techniques Open access
Bernhard Lüttgenau, Sascha Brose, Serhiy Danylyuk, Jochen Stollenwerk, Carlo Holly
0citations -
Design and realization of an in-lab EUV dual beamline for industrial and scientific applications2021 International Conference on Extreme Ultraviolet Lithography conference-paper Engineering Advancements in Photolithography Techniques
Bernhard Lüttgenau, Sascha Brose, Serhiy Danylyuk, Jochen Stollenwerk, Peter Loosen, Carlo Holly
3citations -
Study on the Water Stability of Polyurethane Concrete from Perspective of Polyurethane-Aggregate Interface2022 Journal of Materials in Civil Engineering article Engineering Asphalt Pavement Performance Evaluation
Bin Hong, Jianling Wang, Bin Zhang, Zepeng Fan, Tianshuai Li, Guoyang Lu, +1 more
15citations -
10 clinical tips for advancing patient safety when using syringe pump systems for microinfusion intravenous drug therapy2023 European Journal of Anaesthesiology article Engineering Intravenous Infusion Technology and Safety Open access
Markus Weiß, Anne Catherine van der Eijk, Per‐Arne Lönnqvist, Alberto Lucchini, Annemoon Timmerman
10citations -
Correlation between Electronic Structure, Microstructure, and Switching Mode in Valence Change Mechanism Al2O3/TiOx‐Based Memristive Devices2023 Advanced Electronic Materials article Engineering Advanced Memory and Neural Computing Open access
Stephan Aussen, Felix Cüppers, Carsten Funck, Janghyun Jo, Stephan Werner, Christoph Pratsch, +5 more
23citations -
Influence of Top Electrode Metal on Resistive Switching in Multilayer MOCVD MoS 2 Memristors2026 Advanced Electronic Materials article Engineering Advanced Memory and Neural Computing Open access
Dennis Braun, Jing Liu, Vasilis A. Maroufidis, Hleb Fiadziushkin, Lukas Völkel, Jimin Lee, +10 more
2citations