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Fabrication of gate electrodes for scalable quantum computing using CMOS industry compatible e-beam lithography and numerical simulation of the resulting quantum device2023 European Mask and Lithography Conference (EMLC) conference-paper Engineering Advancements in Photolithography Techniques
Varvara Brackmann, Malte Neul, W. Langheinrich, Maik Simon, Pascal Muster, Sebastian Pregl, +11 more
2citations -
Supplementary files to "Finding the Right TEMPO: Multi-Objective Virtual Screening and Experimental Validation of TEMPO Derivatives for Aqueous Redox Flow Battery Catholytes"2026 Zenodo (CERN European Organization for Nuclear Research) supplementary-materials Engineering Advanced battery technologies research Open access
Daniel Willimetz, Žak Ruben Šinkovec, Jan Hamaekers, Alexei A. Lapkin, Abhishek Khetan
0citations -
Supplementary files to "Finding the Right TEMPO: Multi-Objective Virtual Screening and Experimental Validation of TEMPO Derivatives for Aqueous Redox Flow Battery Catholytes"2026 Zenodo (CERN European Organization for Nuclear Research) supplementary-materials Engineering Advanced battery technologies research Open access
Daniel Willimetz, Žak Ruben Šinkovec, Jan Hamaekers, Alexei A. Lapkin, Abhishek Khetan
0citations
10 results