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Correlative characterization of plasma etching resistance of various aluminum garnets2024 Journal of the American Ceramic Society article Engineering Plasma Diagnostics and Applications Open access
Christian Stern, Christian Günter Georg Schwab, Moritz Kindelmann, Mark Stamminger, Thomas E. Weirich, Inhee Park, +4 more
12citations -
COvalent monolayer patterns in Microfluidics by PLasma etching Open Technology – COMPLOT2020 The Analyst article Engineering Microfluidic and Capillary Electrophoresis Applications Open access
Stan B. J. Willems, Jaccoline M. S. Zegers, Anton Bunschoten, R. Martijn Wagterveld, Fijs W. B. van Leeuwen, Aldrik H. Velders, +1 more
12citations -
The role of fluorination during the physicochemical erosion of yttria in fluorine-based etching plasmas2021 Journal of the European Ceramic Society article Engineering Plasma Diagnostics and Applications
Moritz Kindelmann, Moritz Lukas Weber, Mark Stamminger, Rahel Buschhaus, E. Wessel, Martin Bram, +1 more
24citations -
Processing map to control the erosion of Y 2 O 3 in fluorine based etching plasmas2022 Journal of the American Ceramic Society article Engineering Plasma Diagnostics and Applications Open access
Moritz Kindelmann, Moritz Lukas Weber, Mark Stamminger, Rahel Buschhaus, Uwe Breuer, Martin Bram, +1 more
29citations -
Erosion behavior of Y 2 O 3 in fluorine‐based etching plasmas: Orientation dependency and reaction layer formation2020 Journal of the American Ceramic Society article Engineering Plasma Diagnostics and Applications Open access cited by 1 patent
Moritz Kindelmann, Mark Stamminger, Nino Schön, Marcin Rasinski, Rüdiger‐A. Eichel, Florian Hausen, +2 more
46citations -
Vacancy Defects and Multilayer Shading in Graphene Monolayers: Enhancing Proton Transport in Centimeter-Sized Direct Methanol Fuel Cells2025 ACS Applied Materials & Interfaces article Engineering Fuel Cells and Related Materials Open access
Weizhe Zhang, Xiaoting Liu, Buhang Chen, Luzhao Sun, Zhongfan Liu, Grégory F. Schneider
3citations -
Supramolecular Multilayered Templates for Fabricating Nanometer-Precise Spacings: Implications for the Next-Generation of Devices Integrating Nanogap/Nanochannel Components2020 ACS Applied Nano Materials article Engineering Nanofabrication and Lithography Techniques Open access
Hadi Arjmandi‐Tash, Pauline M. G. van Deursen, Amedeo Bellunato, Clarisse de Sere, Zhanna Overchenko, Karthick Babu Sai Sankar Gupta, +1 more
1citations -
Wafer-Scale Top-Down Patterning of Metal Halide Perovskites2026 Zenodo (CERN European Organization for Nuclear Research) preprint Engineering Perovskite Materials and Applications Open access
Federico Fabrizi, Ardeshir Esteki, Holger Lerch, Saeed Goudarzi, Liudmila Starodubtceva, Gerhard Müller‐Newen, +2 more
0citations
14 results