Advanced atmospheric pressure CVD of a-Si:H using pure and cyclooctane-diluted trisilane as precursors

Sustainable Energy & Fuels, vol. 8, pp. 5568–5580

Abstract

Exploring the effects of cyclooctane dilution, deposition temperature, process duration, and precursor amount on a-Si:H film properties deposited from liquid trisilane in an atmospheric pressure CVD system.

Authors 9

1. Benedikt Fischer corresponding Aachen Faculty of Electrical Engineering and Information Technology

   RWTH Aachen University · Forschungszentrum Jülich · Jülich Aachen Research Alliance

   Affiliation as printed

   IEK-5 Photovoltaik, Forschungszentrum Jülich GmbH, Wilhelm-Johnen Straße, 52425 Jülich, Germany

   Jülich Aachen Research Alliance (JARA-Energy), Faculty of Electrical Engineering and Information Technology, RWTH Aachen University, Schinkelstr. 2, 52062 Aachen, Germany

2. Maurice Nuys

   Forschungszentrum Jülich · FH Münster

   Affiliation as printed

   Department of Energy Building Services Environmental Engineering, University of Applied Sciences Muenster, Stegerwaldstraße 39, 48565 Steinfurt, Germany

   IEK-5 Photovoltaik, Forschungszentrum Jülich GmbH, Wilhelm-Johnen Straße, 52425 Jülich, Germany

3. Oleksandr Astakhov

   Forschungszentrum Jülich

   Affiliation as printed

   IEK-5 Photovoltaik, Forschungszentrum Jülich GmbH, Wilhelm-Johnen Straße, 52425 Jülich, Germany

4. Stefan Haas Aachen Department of Aerospace Engineering

   FH Aachen · Forschungszentrum Jülich

   Affiliation as printed

   Department of Aerospace Engineering, FH Aachen University of Applied Sciences, 52066 Aachen, Germany

   IEK-5 Photovoltaik, Forschungszentrum Jülich GmbH, Wilhelm-Johnen Straße, 52425 Jülich, Germany

5. Michael Schaaf

   Forschungszentrum Jülich

   Affiliation as printed

   ZEA-1 Engineering und Technologie, Forschungszentrum Jülich GmbH, Wilhelm-Johnen Straße, 52425 Jülich, Germany

6. Astrid Besmehn

   Forschungszentrum Jülich

   Affiliation as printed

   IEK-14 Elektrochemische Verfahrenstechnik, Forschungszentrum Jülich GmbH, Wilhelm-Johnen Straße, 52425 Jülich, Germany

7. Peter Jakes

   Forschungszentrum Jülich

   Affiliation as printed

   IEK-9 Grundlagen der Elektrochemie, Forschungszentrum Jülich GmbH, Wilhelm-Johnen Straße, 52425 Jülich, Germany

8. Rüdiger‐A. Eichel Aachen Institute of Physical Chemistry

   RWTH Aachen University · Forschungszentrum Jülich

   Affiliation as printed

   IEK-9 Grundlagen der Elektrochemie, Forschungszentrum Jülich GmbH, Wilhelm-Johnen Straße, 52425 Jülich, Germany

   Institute of Physical Chemistry, RWTH Aachen University, 52074 Aachen, Germany

9. Uwe Rau Aachen Faculty of Electrical Engineering and Information Technology

   RWTH Aachen University · Forschungszentrum Jülich · Jülich Aachen Research Alliance

   Affiliation as printed

   IEK-5 Photovoltaik, Forschungszentrum Jülich GmbH, Wilhelm-Johnen Straße, 52425 Jülich, Germany

   Jülich Aachen Research Alliance (JARA-Energy), Faculty of Electrical Engineering and Information Technology, RWTH Aachen University, Schinkelstr. 2, 52062 Aachen, Germany