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Improvement of nanoscale line-edge roughness by conformal deposition
2026
Journal of Micromechanics and Microengineering
article
Engineering
Advancements in Photolithography Techniques
Open access
Michail Michailow
,
Patrick Liebisch
,
Till Tenger
,
Joachim Knoch
0
citations
Improvement of nanoscale line-edge roughness by conformal deposition
2026
Journal of Micromechanics and Microengineering
article
Engineering
Advancements in Photolithography Techniques
Open access
Michail Michailow
,
Patrick Liebisch
,
Till Tenger
,
Joachim Knoch
0
citations
2 results