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Erosion behavior of Y 2 O 3 in fluorine‐based etching plasmas: Orientation dependency and reaction layer formation2020 Journal of the American Ceramic Society article Engineering Plasma Diagnostics and Applications Open access cited by 1 patent
Moritz Kindelmann, Mark Stamminger, Nino Schön, Marcin Rasinski, Rüdiger‐A. Eichel, Florian Hausen, +2 more
46citations
2 results