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Key Role of Very Low Energy Electrons in Tin-Based Molecular Resists for Extreme Ultraviolet Nanolithography2020 ACS Applied Materials & Interfaces article Engineering Advancements in Photolithography Techniques Open access cited by 21 patents
Ivan Bespalov, Yu Zhang, Jarich Haitjema, Rudolf M. Tromp, Sense Jan van der Molen, Albert Manfred Brouwer, +2 more
113citations -
Influence of multiple detection events on compositional accuracy of TiN coatings in atom probe tomography2023 Surface and Coatings Technology article Engineering Advanced Materials Characterization Techniques Open access
Maximilian Schiester, Helene Waldl, Marcus Hans, Mattias Thuvander, Daniel Primetzhofer, Nina Schalk, +1 more
18citations
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