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Ultrasmooth Sub-Nanometer Chemical SiO 2 Surfaces and Enhanced Interface Characteristics via High-pH Fluoride Treatment for Si/HfO 2 MOS Devices2026 ACS Applied Materials & Interfaces article Engineering Semiconductor materials and devices Open access
Yu-Chen Chang, Mykhaylo Motylenko, Yu-Tzu Liao, Jingxuan Sun, Martin Kasavetov, Viviana Rincón Montes, +3 more
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