Residual stress measurement of physical vapor deposition (PVD) AlTiN thin films - a comparative study of x-Ray diffraction-, Raman spectroscopic and ring core method

The International Journal of Advanced Manufacturing Technology

Authors 16

1. Hilke Petersen
2. Arnd Heckemeyer
3. Bernd Breidenstein
4. Christoph Kahra
5. Sebastian Herbst
6. Finn Rümenapf
7. Nelson Filipe Lopes Dias
8. Nils Denkmann
9. Muhammad Tayyab Aachen

   RWTH Aachen University

   Affiliation as printed

   RWTH Aachen

10. Benjamin Bergmann
11. Kai Donnerbauer
12. Frank Walther
13. Wolfgang Tillmann
14. Jörg Debus
15. Hans Jürgen Maier
16. Kirsten Bobzin Aachen

    RWTH Aachen University

    Affiliation as printed

    RWTH Aachen