April 28, 2026 article Open access Plasma‐Sequence‐Engineered Atomic Layer Deposition of Ultra‐Thin SiN x for Enhanced Etching Resistance in Extreme Ultraviolet Pellicles Advanced Materials Interfaces DOI: 10.1002/admi.202501045 Full text (OA) OpenAlex Authors 0 Author list not loaded yet. Cited by 0 stored of 0 References 1 Search Sort Most cited Newest Oldest Patent citations Title Any typearticle review book-chapter conference-paper preprint dissertation book dataset other Any fieldAgricultural and Biological Sciences Arts and Humanities Biochemistry, Genetics and Molecular Biology Business, Management and Accounting Chemical Engineering Chemistry Computer Science Decision Sciences Dentistry Earth and Planetary Sciences Economics, Econometrics and Finance Energy Engineering Environmental Science Health Professions Immunology and Microbiology Materials Science Mathematics Medicine Neuroscience Nursing Pharmacology, Toxicology and Pharmaceutics Physics and Astronomy Psychology Social Sciences Veterinary Open access Anderson’s negative- U chemistry in amorphous silicon nitride: A complex system approach 2025 Science Advances article Engineering Semiconductor materials and devices Open access 6 citations 1 result