Intermediate Resistive State in Wafer‐Scale Vertical MoS 2 Memristors Through Lateral Silver Filament Growth for Artificial Synapse Applications
Abstract
ABSTRACT Memristors based on 2D materials have garnered significant attention. Their fast resistive switching (RS) behavior and atomic‐level thickness enable low power consumption, making them promising candidates for neuromorphic computing. Among these, memristors based on molybdenum disulfide (MoS 2 ) have been extensively studied. Their RS has been attributed to the formation and rupture of conductive filaments (CFs). However, the underlying mechanism of filament formation remains underexplored, and the inherently stochastic nature of RS leads to high variability and limited reproducibility. In this study, we demonstrate wafer‐scale memristors based on metal–organic chemical vapor‐deposited MoS 2 . Our devices exhibit both volatile and nonvolatile RS behaviors, tunable by modulating the current compliance. Notably, we observe stable RS characteristics in an intermediate resistive state (IRS), set and reset voltages within ±1 V, endurance of over 2500 cycles, and state retention over 10 6 s. Among 100 tested devices, 98 exhibited IRS behavior, confirming a high yield (98%) and demonstrating its robust and reproducible RS nature. Combined experimental and simulation results further indicate that the IRS arises from the lateral growth of CFs in the van der Waals gaps. Furthermore, the devices successfully emulate synaptic plasticity with current responses on a microsecond timescale, highlighting their potential for large‐scale integration in neuromorphic computing architectures.
Authors 20
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Yuan Fa Aachen Chair of Electronic Devices AMO GmbH Advanced Microelectronic Center Aachen Aachen Germany
RWTH Aachen University · AMO (Germany)
Affiliation as printed
AMO GmbH Advanced Microelectronic Center Aachen Aachen Germany
Chair of Electronic Devices (ELD) RWTH Aachen University Aachen Germany
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Milan Buttberg Aachen Institute of Materials in Electrical Engineering and Information Technology II
Affiliation as printed
Institute of Materials in Electrical Engineering and Information Technology II (IWE2) RWTH Aachen University Aachen Germany
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Ke Ran Aachen Central Facility for Electron Microscopy AMO GmbH Advanced Microelectronic Center Aachen Aachen Germany
RWTH Aachen University · AMO (Germany) · Forschungszentrum Jülich · Ernst Ruska Centre
Affiliation as printed
AMO GmbH Advanced Microelectronic Center Aachen Aachen Germany
Central Facility for Electron Microscopy (GFE) RWTH Aachen University Aachen Germany
Ernst Ruska‐Centre for Microscopy and Spectroscopy with Electrons (ER‐C 2) Forschungszentrum Jülich GmbH Jülich Germany
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Forschungszentrum Jülich · Jülich Aachen Research Alliance
Affiliation as printed
Peter Grünberg Institute 7 (PGI 7) and JARA‐FIT Forschungszentrum Jülich GmbH Jülich Germany
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Affiliation as printed
Chair of Electronic Devices (ELD) RWTH Aachen University Aachen Germany
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Affiliation as printed
Chair of Electronic Devices (ELD) RWTH Aachen University Aachen Germany
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Affiliation as printed
Chair of Electronic Devices (ELD) RWTH Aachen University Aachen Germany
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Affiliation as printed
Chair of Electronic Devices (ELD) RWTH Aachen University Aachen Germany
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Eindhoven University of Technology
Affiliation as printed
Department of Applied Physics and Science Education Eindhoven University of Technology Eindhoven The Netherlands
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Affiliation as printed
AMO GmbH Advanced Microelectronic Center Aachen Aachen Germany
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Affiliation as printed
AMO GmbH Advanced Microelectronic Center Aachen Aachen Germany
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Affiliation as printed
AMO GmbH Advanced Microelectronic Center Aachen Aachen Germany
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Affiliation as printed
Compound Semiconductor Technology (CST) RWTH Aachen University Aachen Germany
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RWTH Aachen University · Aixtron (Germany)
Affiliation as printed
AIXTRON SE Herzogenrath Germany
Compound Semiconductor Technology (CST) RWTH Aachen University Aachen Germany
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Affiliation as printed
Compound Semiconductor Technology (CST) RWTH Aachen University Aachen Germany
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RWTH Aachen University · Forschungszentrum Jülich · Ernst Ruska Centre
Affiliation as printed
Central Facility for Electron Microscopy (GFE) RWTH Aachen University Aachen Germany
Ernst Ruska‐Centre for Microscopy and Spectroscopy with Electrons (ER‐C 2) Forschungszentrum Jülich GmbH Jülich Germany
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Affiliation as printed
AMO GmbH Advanced Microelectronic Center Aachen Aachen Germany
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Forschungszentrum Jülich · Bulgarian Academy of Sciences · Jülich Aachen Research Alliance
Affiliation as printed
Peter Grünberg Institute 7 (PGI 7) and JARA‐FIT Forschungszentrum Jülich GmbH Jülich Germany
“Acad. Evgeni Budevski” IEE‐BAS Bulgarian Academy of Sciences (BAS) Sofia Bulgaria
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Forschungszentrum Jülich · Jülich Aachen Research Alliance
Affiliation as printed
Peter Grünberg Institute 7 (PGI 7) and JARA‐FIT Forschungszentrum Jülich GmbH Jülich Germany
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Max C. Lemme corresponding Aachen Chair of Electronic Devices AMO GmbH Advanced Microelectronic Center Aachen Aachen Germany
RWTH Aachen University · AMO (Germany)
Affiliation as printed
AMO GmbH Advanced Microelectronic Center Aachen Aachen Germany
Chair of Electronic Devices (ELD) RWTH Aachen University Aachen Germany
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