January 23, 2025 article Open access Etchant‐Free Dry‐Developable Extreme Ultraviolet Photoresist Materials Utilizing N‐Heterocyclic Carbene–Metal Complexes Small DOI: 10.1002/smll.202407966 Full text (OA) OpenAlex Authors 0 Author list not loaded yet. Cited by 0 stored of 6 References 2 Search Sort Most cited Newest Oldest Patent citations Title Any typearticle review book-chapter conference-paper preprint dissertation book dataset other Any fieldAgricultural and Biological Sciences Arts and Humanities Biochemistry, Genetics and Molecular Biology Business, Management and Accounting Chemical Engineering Chemistry Computer Science Decision Sciences Dentistry Earth and Planetary Sciences Economics, Econometrics and Finance Energy Engineering Environmental Science Health Professions Immunology and Microbiology Materials Science Mathematics Medicine Neuroscience Nursing Pharmacology, Toxicology and Pharmaceutics Physics and Astronomy Psychology Social Sciences Veterinary Open access Key Role of Very Low Energy Electrons in Tin-Based Molecular Resists for Extreme Ultraviolet Nanolithography 2020 ACS Applied Materials & Interfaces article Engineering Advancements in Photolithography Techniques Open access cited by 21 patents 113 citations First Principles Study of Decomposition Reactions in the Electrolyte System Ethylene Carbonate and Lithium Hexafluorophosphate 2023 ECS Advances article Engineering Advancements in Battery Materials Open access 4 citations 2 results