Strain Engineered Electrically Pumped SiGeSn Microring Lasers on Si

ACS Photonics, vol. 10, pp. 217–224

Abstract

High Resolution Image Download MS PowerPoint Slide SiGeSn holds great promise for enabling fully group-IV integrated photonics operating at wavelengths extending in the mid-infrared range. Here, we demonstrate an electrically pumped GeSn microring laser based on SiGeSn/GeSn heterostructures. The ring shape allows for enhanced strain relaxation, leading to enhanced optical properties, and better guiding of the carriers into the optically active region. We have engineered a partial undercut of the ring to further promote strain relaxation while maintaining adequate heat sinking. Lasing is measured up to 90 K, with a 75 K T 0 . Scaling of the threshold current density as the inverse of the outer circumference is linked to optical losses at the etched surface, limiting device performance. Modeling is consistent with experiments across the range of explored inner and outer radii. These results will guide additional device optimization, aiming at improving electrical injection and using stressors to increase the bandgap directness of the active material.

Authors 13

1. Bahareh Marzban Aachen Institute of Integrated Photonics (IPH)

   RWTH Aachen University

   Affiliation as printed

   Institute of Integrated Photonics, RWTH Aachen University and JARA-Fundamentals of Future Information Technologies, 52074 Aachen, Germany

2. Lukas Seidel

   University of Stuttgart

   Affiliation as printed

   Institut für Halbleitertechnik, University of Stuttgart, 70569 Stuttgart, Germany

3. Teren Liu

   Forschungszentrum Jülich · Jülich Aachen Research Alliance

   Affiliation as printed

   Peter Grünberg Institute 9, Forschungszentrum Jülich and JARA-Fundamentals of Future Information Technologies, 52428 Jülich, Germany

4. Kui Wu Aachen Institute of Integrated Photonics (IPH)

   RWTH Aachen University

   Affiliation as printed

   Institute of Integrated Photonics, RWTH Aachen University and JARA-Fundamentals of Future Information Technologies, 52074 Aachen, Germany

5. Vivien Kiyek

   Forschungszentrum Jülich · Jülich Aachen Research Alliance

   Affiliation as printed

   Peter Grünberg Institute 9, Forschungszentrum Jülich and JARA-Fundamentals of Future Information Technologies, 52428 Jülich, Germany

6. Marvin Hartwig Zoellner

   Leibniz Institute for High Performance Microelectronics

   Affiliation as printed

   IHP-Leibniz Institut für innovative Mikroelektronik, 15236 Frankfurt (Oder), Germany

7. Z. Ikonić

   University of Leeds

   Affiliation as printed

   School of Electronic and Electrical Engineering, University of Leeds, Leeds LS2 9JT, United Kingdom

8. Jörg Schulze

   University of Stuttgart

   Affiliation as printed

   Institut für Halbleitertechnik, University of Stuttgart, 70569 Stuttgart, Germany

9. Detlev Grützmacher

   Forschungszentrum Jülich · Jülich Aachen Research Alliance

   Affiliation as printed

   Peter Grünberg Institute 9, Forschungszentrum Jülich and JARA-Fundamentals of Future Information Technologies, 52428 Jülich, Germany

10. Giovanni Capellini

    Roma Tre University · Leibniz Institute for High Performance Microelectronics

    Affiliation as printed

    Department of Science, Roma Tre University, Viale G. Marconi 446, 00146 Rome, Italy

    IHP-Leibniz Institut für innovative Mikroelektronik, 15236 Frankfurt (Oder), Germany

11. Michael Oehme

    University of Stuttgart

    Affiliation as printed

    Institut für Halbleitertechnik, University of Stuttgart, 70569 Stuttgart, Germany

12. Jeremy Witzens corresponding Aachen Institute of Integrated Photonics (IPH)

    RWTH Aachen University

    Affiliation as printed

    Institute of Integrated Photonics, RWTH Aachen University and JARA-Fundamentals of Future Information Technologies, 52074 Aachen, Germany

13. Dan Buca corresponding

    Forschungszentrum Jülich · Jülich Aachen Research Alliance

    Affiliation as printed

    Peter Grünberg Institute 9, Forschungszentrum Jülich and JARA-Fundamentals of Future Information Technologies, 52428 Jülich, Germany