April 08, 2022 article Open access Spatial modulation of nanopattern dimensions by combining interference lithography and grayscale-patterned secondary exposure Light Science & Applications DOI: 10.1038/s41377-022-00774-z Full text (OA) OpenAlex Authors 0 Author list not loaded yet. Cited by 1 stored of 35 Search Sort Most cited Newest Oldest Patent citations Title Any typearticle review book-chapter conference-paper preprint dissertation book dataset other Any fieldAgricultural and Biological Sciences Arts and Humanities Biochemistry, Genetics and Molecular Biology Business, Management and Accounting Chemical Engineering Chemistry Computer Science Decision Sciences Dentistry Earth and Planetary Sciences Economics, Econometrics and Finance Energy Engineering Environmental Science Health Professions Immunology and Microbiology Materials Science Mathematics Medicine Neuroscience Nursing Pharmacology, Toxicology and Pharmaceutics Physics and Astronomy Psychology Social Sciences Veterinary Open access Spatial light modulator-based maskless laser lithography using Fourier filtering and focal shift 2022 Journal of Physics D Applied Physics article Engineering Advanced Optical Imaging Technologies Open access 4 citations 1 result References 0