Unravelling the ion-energy-dependent structure evolution and its implications for the elastic properties of (V,Al)N thin films
Acta Materialia, vol. 214, pp. 117003
Abstract
Ion irradiation-induced changes in the structure and mechanical properties of metastable cubic (V,Al)N deposited by reactive high power pulsed magnetron sputtering are systematically investigated by correlating experiments and theory in the ion kinetic energy (Ek) range from 4 to 154 eV. Increasing Ek results in film densification and the evolution from a columnar (111) oriented structure at Ek ≤ 24 eV to a fine-grained structure with (100) preferred orientation for Ek ≥ 104 eV. Furthermore, the compressive intrinsic stress increases by 336 % to -4.8 GPa as Ek is increased from 4 to 104 eV. Higher ion kinetic energy causes stress relaxation to -2.7 GPa at 154 eV. These ion irradiation-induced changes in the thin film stress state are in good agreement with density functional theory simulations. Furthermore, the measured elastic moduli of (V,Al)N thin films exhibit no significant dependence on Ek. The apparent independence of the elastic modulus on Ek can be rationalized by considering the concurrent and balancing effects of bombardment-induced formation of Frenkel pairs (causing a decrease in elastic modulus) and evolution of compressive intrinsic stress (causing an increase in elastic modulus). Hence, the evolution of the film stresses and mechanical properties can be understood based on the complex interplay of ion irradiation-induced defect generation and annihilation.
Authors 9
-
Affiliation as printed
Materials Chemistry, RWTH Aachen University, Kopernikusstr. 10, 52074 Aachen, Germany
-
Affiliation as printed
Department of Materials Science and Applied Mathematics, Malmö University, 20506 Malmö, Sweden
-
Leibniz Institute of Surface Engineering
Affiliation as printed
Leibniz Institute of Surface Engineering (IOM), Permoserstr. 15, 04318 Leipzig, Germany
-
Affiliation as printed
Materials Chemistry, RWTH Aachen University, Kopernikusstr. 10, 52074 Aachen, Germany
-
Affiliation as printed
Materials Chemistry, RWTH Aachen University, Kopernikusstr. 10, 52074 Aachen, Germany
-
Affiliation as printed
Materials Chemistry, RWTH Aachen University, Kopernikusstr. 10, 52074 Aachen, Germany
-
Affiliation as printed
Department of Physics and Astronomy, Uppsala University, Lägerhyddsvägen 1, 75120 Uppsala, Sweden
-
Leibniz Institute of Surface Engineering · Leipzig University
Affiliation as printed
Felix Bloch Institute, Leipzig University, Linnéstr. 5, 04103 Leipzig, Germany
Leibniz Institute of Surface Engineering (IOM), Permoserstr. 15, 04318 Leipzig, Germany
-
Affiliation as printed
Materials Chemistry, RWTH Aachen University, Kopernikusstr. 10, 52074 Aachen, Germany
Cited by 30 stored of 30
Cited by patents worldwide 1 (Lens.org)
-
METHOD FOR PRODUCING A MXAl1-XN BASED THIN FILMS WITH INCREASED THERMAL STABILITYWO2023143857A1 2023-08-03 Pending