October 04, 2019 article Open access Target materials for efficient plasma-based extreme ultraviolet sources in the range of 6 to 8 nm Journal of Physics D Applied Physics DOI: 10.1088/1361-6463/ab4317 Full text (OA) OpenAlex Authors 0 Author list not loaded yet. Cited by 2 stored of 10 Search Sort Most cited Newest Oldest Patent citations Title Any typearticle review book-chapter conference-paper preprint dissertation book dataset other Any fieldAgricultural and Biological Sciences Arts and Humanities Biochemistry, Genetics and Molecular Biology Business, Management and Accounting Chemical Engineering Chemistry Computer Science Decision Sciences Dentistry Earth and Planetary Sciences Economics, Econometrics and Finance Energy Engineering Environmental Science Health Professions Immunology and Microbiology Materials Science Mathematics Medicine Neuroscience Nursing Pharmacology, Toxicology and Pharmaceutics Physics and Astronomy Psychology Social Sciences Veterinary Open access Pulsed Plasma EUV Sources 2023 RWTHedition book-chapter Engineering Advancements in Photolithography Techniques 0 citations Extreme Ultraviolet Radiation Sources from Dense Plasmas 2023 Atoms article Physics and Astronomy Atomic and Molecular Physics Open access 4 citations 2 results References 0