High precision correlative analysis of dielectric behavior evolution and anisotropy in graphene oxide thin film as a function of thermal annealing parameters

Nano Trends, vol. 11, pp. 100130

Abstract

ABSTRACT Graphene oxide (GO) and reduced graphene oxide (rGO) attract keen interest from different science and technology sectors owing to their tunable material characteristics dependent on C/O ratio. Thermal annealing in different gaseous environments serves as an effective approach to manipulate the C/O ratio in graphitic lattice, making it suitable for various electronic, optical and composites applications. Despite regular use of thermal annealing, a systematic study of dielectric properties evolution in GO against different annealing parameters remains elusive. This work reports on a reliable approach that adopts a joint Raman Spectroscopy, Mueller Matrix Spectroscopic Ellipsometry (MMSE) and high-precision electrical impedance spectroscopy (HP-EIS) framework for studying the evolution of dielectric behavior and anisotropies in GO. The experimental platform involved lithography-defined GO patterns connected to metal microelectrodes and glass passivated for protection from gaseous environments during annealing and measurements using Raman, MMSE and HP-EIS. The presented study delineates the effects of annealing parameters such as temperature, heating rate, and gaseous environment on GO permittivity. Novel findings include the discovery of a direct relationship between heating rate and dielectric properties, as well as determination of vertical limitation of MMSE for permittivity distribution characterization in GO, for the first time, to be around 8 nm.

Authors 14

1. Hesam Amiri Aachen Institute of Materials in Electrical Engineering 1

   RWTH Aachen University

   Affiliation as printed

   Institute of Materials in Electrical Engineering 1, RWTH Aachen University, Sommerfeldstrasse 24, 52074 Aachen, Germany

2. Aidin Nikookhesal Aachen Institute of Materials in Electrical Engineering 1

   RWTH Aachen University

   Affiliation as printed

   Institute of Materials in Electrical Engineering 1, RWTH Aachen University, Sommerfeldstrasse 24, 52074 Aachen, Germany

3. Divagar Murugan Aachen Institute of Materials in Electrical Engineering 1

   RWTH Aachen University

   Affiliation as printed

   Institute of Materials in Electrical Engineering 1, RWTH Aachen University, Sommerfeldstrasse 24, 52074 Aachen, Germany

4. M. Frentzen Aachen Institute of Semiconductors technology

   RWTH Aachen University

   Affiliation as printed

   Institute of Semiconductors technology, RWTH Aachen University, Sommerfeldstrasse 24, 52074 Aachen, Germany

5. Yuan Cao Aachen Institute of Materials in Electrical Engineering 1

   RWTH Aachen University

   Affiliation as printed

   Institute of Materials in Electrical Engineering 1, RWTH Aachen University, Sommerfeldstrasse 24, 52074 Aachen, Germany

6. Philip Nickl

   Federal Institute For Materials Research and Testing · Freie Universität Berlin

   Affiliation as printed

   Division 6.1 - Surface Analysis and Interfacial Chemistry BAM – Federal Institute for Material Science and Testing, Unter den Eichen 44-46, 12205 Berlin, Germany

   Institut für Chemie und Biochemie, Freie Universität Berlin, Takustr. 3, 14195 Berlin, Germany

7. Jörg Radnik

   Federal Institute For Materials Research and Testing

   Affiliation as printed

   Division 6.1 - Surface Analysis and Interfacial Chemistry BAM – Federal Institute for Material Science and Testing, Unter den Eichen 44-46, 12205 Berlin, Germany

8. Jörg M. Stockmann

   Federal Institute For Materials Research and Testing

   Affiliation as printed

   Division 6.1 - Surface Analysis and Interfacial Chemistry BAM – Federal Institute for Material Science and Testing, Unter den Eichen 44-46, 12205 Berlin, Germany

9. Xuan Thang Vu Aachen Institute of Materials in Electrical Engineering 1

   RWTH Aachen University

   Affiliation as printed

   Institute of Materials in Electrical Engineering 1, RWTH Aachen University, Sommerfeldstrasse 24, 52074 Aachen, Germany

10. Narayanan Madaboosi

    Indian Institute of Technology Madras

    Affiliation as printed

    Department of Biotechnology, Bhupat and Jyoti Mehta School of Biosciences, Indian Institute of Technology Madras, Chennai 600036, India

11. Joachim Knoch Aachen Institute of Semiconductors technology

    RWTH Aachen University

    Affiliation as printed

    Institute of Semiconductors technology, RWTH Aachen University, Sommerfeldstrasse 24, 52074 Aachen, Germany

12. Sven Ingebrandt Aachen Institute of Materials in Electrical Engineering 1

    RWTH Aachen University

    Affiliation as printed

    Institute of Materials in Electrical Engineering 1, RWTH Aachen University, Sommerfeldstrasse 24, 52074 Aachen, Germany

13. Mohsen Adeli

    Lorestan University · Freie Universität Berlin

    Affiliation as printed

    Department of Organic Chemistry, Faculty of Chemistry, Lorestan University, Khorramabad, Iran

    Institut für Chemie und Biochemie, Freie Universität Berlin, Takustr. 3, 14195 Berlin, Germany

14. Vivek Pachauri corresponding Aachen Institute of Materials in Electrical Engineering 1

    RWTH Aachen University

    Affiliation as printed

    Institute of Materials in Electrical Engineering 1, RWTH Aachen University, Sommerfeldstrasse 24, 52074 Aachen, Germany