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Restoring sputter damage by light soaking in silicon carbide-based transparent passivating contact solar cells

Cell Reports Physical Science, vol. 6, pp. 102552

Abstract

Crystalline silicon (c-Si) solar cells with hydrogenated nanocrystalline silicon carbide (nc-SiC:H)-based transparent passivating contact (TPC) achieve enhanced short-circuit current density ( J SC ) compared to conventional silicon heterojunction (SHJ) solar cells but suffer from lower open-circuit voltage ( V OC ). The V OC loss is largely due to sputter damage during Sn-doped indium tin oxide window layer deposition. We evaluate thermal annealing for damage mitigation but find limited restoration due to differing thermal tolerances of TPC and SHJ contacts. Instead, a direct heat-assisted intensive light-soaking (LiSo) treatment effectively heals the sputter damage, improving V OC above 735 mV and achieving a certified efficiency of 24.17% ± 0.29%. Detailed investigation highlights the synergistic effects of light and heat in the LiSo process. Additionally, a damage-restoration mechanism related to hydrogen motion is discussed.

Authors 9

  1. Binbin Xu corresponding Aachen

    Forschungszentrum Jülich · Jülich Aachen Research Alliance · RWTH Aachen University

    Affiliation as printed

    IMD-3 Photovoltaics, Forschungszentrum Jülich GmbH, 52428 Jülich, Germany

    Jülich-Aachen Research Alliance (JARA-Energy) and Faculty of Electrical Engineering and Information Technology, RWTH Aachen University, Schinkelstr. 2, 52062 Aachen, Germany

  2. Alexander Eberst corresponding Aachen

    Forschungszentrum Jülich · Jülich Aachen Research Alliance · RWTH Aachen University

    Affiliation as printed

    IMD-3 Photovoltaics, Forschungszentrum Jülich GmbH, 52428 Jülich, Germany

    Jülich-Aachen Research Alliance (JARA-Energy) and Faculty of Electrical Engineering and Information Technology, RWTH Aachen University, Schinkelstr. 2, 52062 Aachen, Germany

  3. Forschungszentrum Jülich

    Affiliation as printed

    IMD-3 Photovoltaics, Forschungszentrum Jülich GmbH, 52428 Jülich, Germany

  4. Forschungszentrum Jülich · Jülich Aachen Research Alliance · RWTH Aachen University

    Affiliation as printed

    IMD-3 Photovoltaics, Forschungszentrum Jülich GmbH, 52428 Jülich, Germany

    Jülich-Aachen Research Alliance (JARA-Energy) and Faculty of Electrical Engineering and Information Technology, RWTH Aachen University, Schinkelstr. 2, 52062 Aachen, Germany

  5. Forschungszentrum Jülich

    Affiliation as printed

    IMD-3 Photovoltaics, Forschungszentrum Jülich GmbH, 52428 Jülich, Germany

  6. Forschungszentrum Jülich

    Affiliation as printed

    IMD-3 Photovoltaics, Forschungszentrum Jülich GmbH, 52428 Jülich, Germany

  7. Forschungszentrum Jülich

    Affiliation as printed

    IMD-3 Photovoltaics, Forschungszentrum Jülich GmbH, 52428 Jülich, Germany

  8. Uwe Rau corresponding Aachen

    Forschungszentrum Jülich · Jülich Aachen Research Alliance · RWTH Aachen University

    Affiliation as printed

    IMD-3 Photovoltaics, Forschungszentrum Jülich GmbH, 52428 Jülich, Germany

    Jülich-Aachen Research Alliance (JARA-Energy) and Faculty of Electrical Engineering and Information Technology, RWTH Aachen University, Schinkelstr. 2, 52062 Aachen, Germany

  9. Kaining Ding corresponding

    Forschungszentrum Jülich

    Affiliation as printed

    IMD-3 Photovoltaics, Forschungszentrum Jülich GmbH, 52428 Jülich, Germany

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References 36