Wafer-scale robust graphene electronics under industrial processing conditions

Chemical Communications, vol. 62, pp. 14225–14229

Abstract

acidic and alkaline solutions, several organic solvents, and sonication. Moreover, devices were produced with a measurement yield up to 99.7% and reproducible device-to-device electronic performance on 4-inch silicon wafers.

Authors 9

1. Erik P. van Geest Aachen Kamerlingh Onnes Laboratory

   Leiden University

   Affiliation as printed

   Leiden Institute of Chemistry, Leiden University, Einsteinweg 55, 2333CC, Leiden, The Netherlands

   Leiden Institute of Physics, Leiden University, Kamerlingh Onnes Laboratory, Niels Bohrweg 2, 2333 CA, Leiden, The Netherlands

2. Max Makurat Aachen Kamerlingh Onnes Laboratory

   Leiden University

   Affiliation as printed

   Leiden Institute of Chemistry, Leiden University, Einsteinweg 55, 2333CC, Leiden, The Netherlands

   Leiden Institute of Physics, Leiden University, Kamerlingh Onnes Laboratory, Niels Bohrweg 2, 2333 CA, Leiden, The Netherlands

3. Clément Maheu

   Centre National de la Recherche Scientifique · Technische Universität Darmstadt · Institut des Matériaux Jean Rouxel · Nantes Université

   Affiliation as printed

   Nantes Université, CNRS, Institut des Matériaux de Nantes Jean Rouxel, IMN, F-44000, Nantes, France

   Surface Science Laboratory, Department of Materials and Geosciences, Technical University of Darmstadt, Peter-Grünberg-Straße 4, 64287, Darmstadt, Germany

4. Hikmet Sezen

   Technische Universität Darmstadt

   Affiliation as printed

   Surface Science Laboratory, Department of Materials and Geosciences, Technical University of Darmstadt, Peter-Grünberg-Straße 4, 64287, Darmstadt, Germany

5. Michele Buscema
   Affiliation as printed

   Applied Nanolayers B.V. Feldmannweg 17, 2628 CD, Delft, The Netherlands

6. Dominique Wehenkel
   Affiliation as printed

   Applied Nanolayers B.V. Feldmannweg 17, 2628 CD, Delft, The Netherlands

7. Jan P. Hofmann

   Technische Universität Darmstadt

   Affiliation as printed

   Surface Science Laboratory, Department of Materials and Geosciences, Technical University of Darmstadt, Peter-Grünberg-Straße 4, 64287, Darmstadt, Germany

8. Jan M. van Ruitenbeek Aachen Kamerlingh Onnes Laboratory

   Leiden University

   Affiliation as printed

   Leiden Institute of Physics, Leiden University, Kamerlingh Onnes Laboratory, Niels Bohrweg 2, 2333 CA, Leiden, The Netherlands

9. Grégory F. Schneider Aachen

   Leiden University

   Affiliation as printed

   Leiden Institute of Chemistry, Leiden University, Einsteinweg 55, 2333CC, Leiden, The Netherlands