A

Engineering the Thermal and Energy-Storage Properties in Quantum Dots Using Dominant Faceting: The Case Study of Silicon

ACS Nano, vol. 19, pp. 2196–2212

Abstract

The storage and release of energy is an economic cornerstone. In quantum dots (QDs), energy storage is mostly governed by their surfaces, in particular by surface chemistry and faceting. The impact of surface free energy (SFE) through surface faceting has already been studied in QDs. Here, we introduce dominant faceting representing the structural order of the surface. In particular, we propose that realistic QDs attain complicated polyhedral quasi-spherical shapes while keeping the dominance of a certain type of facet. The type of dominant facet determines the rates of surface-related processes. Therefore, by connecting dominant faceting with SFE, trends analogical to bulk material are kept despite the lack of evident microscopic shape control. To demonstrate the applicability of dominant faceting, we synthesize sets of silicon QDs with sizes around 5 nm and classify them based on increasing SFE of the corresponding analytic geometrical models, using a detailed surface chemistry analysis. Total energies released during oxidation of the synthesized QDs reach the theoretical limit, unlike in the reference, "large" (>100 nm) silicon nanoparticles, which release about 15% less energy. Next, we perform a comprehensive experimental study of dehydrogenation and thermal oxidation of the synthesized QDs in the temperature range of 25-1100 °C, identifying SFE as the key factor determining their thermal stability and surface reactivity. In particular, four distinctive stages of energy release were observed with onset temperatures ranging between 140 and 250 °C, ≈500 and 650-700 °C, respectively, for the SFE-differing samples. Finally, the thermal oxidation of the synthesized QDs is completed at lower temperatures with increasing SFE, decreasing from 1065 to 970 °C and being > 150 °C lower in QDs than in the larger reference nanoparticles. Therefore, despite a rich mixture of features, our description based on linking dominant faceting with SFE allows us to fully explain all the observed trends, demonstrating both the potential of SFE-based engineering of energy-storage properties in QDs and the prospects of silicon QDs as an energy-storage material.

Authors 10

  1. FZU - Institute of Physics of the Czech Academy of Sciences

    Affiliation as printed

    Institute of Physics of the CAS, v.v.i., Cukrovarnická 10, 162 00 Prague 6, Czechia

  2. FZU - Institute of Physics of the Czech Academy of Sciences

    Affiliation as printed

    Institute of Physics of the CAS, v.v.i., Cukrovarnická 10, 162 00 Prague 6, Czechia

  3. FZU - Institute of Physics of the Czech Academy of Sciences

    Affiliation as printed

    Institute of Physics of the CAS, v.v.i., Cukrovarnická 10, 162 00 Prague 6, Czechia

  4. FZU - Institute of Physics of the Czech Academy of Sciences

    Affiliation as printed

    Institute of Physics of the CAS, v.v.i., Cukrovarnická 10, 162 00 Prague 6, Czechia

  5. FZU - Institute of Physics of the Czech Academy of Sciences

    Affiliation as printed

    Institute of Physics of the CAS, v.v.i., Cukrovarnická 10, 162 00 Prague 6, Czechia

  6. Charles University

    Affiliation as printed

    Faculty of Mathematics and Physics, Charles University, Ke Karlovu 3, 121 16 Praha 2, Czechia

  7. FZU - Institute of Physics of the Czech Academy of Sciences

    Affiliation as printed

    Institute of Physics of the CAS, v.v.i., Cukrovarnická 10, 162 00 Prague 6, Czechia

  8. Australian National University · RWTH Aachen University

    Affiliation as printed

    Department of Applied Mathematics, Research School of Physics, The Australian National University, Canberra, ACT 2601, Australia

    Institute of Semiconductor Electronics (IHT), RWTH Aachen University, 52074 Aachen, Germany

    Integrated Materials Design Lab, The Australian National University, Canberra, ACT 2601, Australia

  9. University of Chemistry and Technology, Prague

    Affiliation as printed

    University of Chemistry and Technology, Technická 5,166 28 Praha 6, Czechia

  10. Kateřina Kůsová corresponding

    FZU - Institute of Physics of the Czech Academy of Sciences

    Affiliation as printed

    Institute of Physics of the CAS, v.v.i., Cukrovarnická 10, 162 00 Prague 6, Czechia

Cited by 13 stored of 14

13 results

No patents citing this paper on Lens.org (checked 2026-10-06).

References 72