Database on Certified Reference Materials measured with PAT tools for validation and verification purposes

Zenodo (CERN European Organization for Nuclear Research)

Abstract

The H2020 PAT4Nano project aims to develop and demonstrate Process Analytical Technologies (PAT) tools for nanosuspension characterization which have sufficiently high resolution, accuracy, and speed, for real-time industrial process monitoring and control. Real time monitoring is desired for example to obtain: small, high precision, specialty batch of materials, processing monitoring of nucleation/growth/milling of materials at different scales (lab, pilot, production), and for producing feedback loops (adapt T, pH, etc.,) needed for process control. Laser diffraction (LD), Spatially Resolved Dynamic Light Scattering (SR-DLS), Cross-Correlation Dynamic Light Scattering (CC-DLS), Ultrasound Nanoparticle Sizer (UNPS), Raman, and Transmission Electron Microscopy (TEM) are the main PAT tools used in this project. For validation and verification purposes of these measurement techniques, polystyrene and silica samples (200 and 1000 nm particle size) were selected as (Certified) Reference Materials ((C))RMs) by the consortium partners. The results described in this database are particle size measurements using PAT methods in an offline mode. The particle size and particle size distribution data are presented as the D10, D50 and D90 and PDI/span measured with each PAT tool. Raman spectra of the CRMs are presented as well. Here, particle size data was extracted by using chemometric software. Lastly, TEM images of the CRMs are included in the database to cross-correlate and cross-validate the results of the spectroscopic and scattering PAT tools.

Authors 12

1. Janique Hupperetz

   Netherlands Organisation for Applied Scientific Research

   Affiliation as printed

   TNO, NL

2. Nicole M.M. Meulendijks

   Netherlands Organisation for Applied Scientific Research

   Affiliation as printed

   TNO, NL

3. Daniel Mann

   Netherlands Organisation for Applied Scientific Research

   Affiliation as printed

   TNO, NL

4. Luc Leufkens

   Netherlands Organisation for Applied Scientific Research

   Affiliation as printed

   TNO, NL

5. Ad Gerich
   Affiliation as printed

   InProcess-LSP, NL

6. Carl C. L. Schuurmans
   Affiliation as printed

   InProcess-LSP, NL

7. Alan George Ryder

   Ollscoil na Gaillimhe – University of Galway

   Affiliation as printed

   Nat. University Ireland Galway

8. Andrew Stewart

   University College London

   Affiliation as printed

   University College London

9. Christoph Janzen Aachen Fraunhofer Institute

   Fraunhofer Institute for Laser Technology

   Affiliation as printed

   Fraunhofer Institute, ILT

10. Tina Rowney
    Affiliation as printed

    Malvern Panalytical, UK

11. Steve Ward-Smith
    Affiliation as printed

    Malvern Panalytical, UK

12. Maurits S. van der Heiden

    Netherlands Organisation for Applied Scientific Research

    Affiliation as printed

    TNO, NL