Dynamic correction of optical aberrations for height-independent selective laser induced etching processing strategies

Optics Express, vol. 31, pp. 26104

Abstract

Optical aberrations are a critical issue for tight focusing and high precision manufacturing with ultrashort pulsed laser radiation in transparent media. Controlling the wave front of ultrashort laser pulses enable the correction of low order phase front distortion and significantly enhances the simplification of laser-based manufacturing of 3D-parts in glass. The influence of system-inherent, dominating aberrations such as spherical and astigmatic aberrations affect the focal area, the beam caustic and therefore the focus intensity distribution. We correct these aberrations by means of a spatial light modulator (SLM) for various processing depths in glass thickness of up to 12 mm. This flexible aberration correction significantly simplifies the process control and scanning strategies for the selective laser induced etching process. The influence on the selectivity is investigated by comparing the three different focus conditions of the intrinsic microscope objective aberration corrected, the aberrated and the SLM aberration corrected beam profile. The previously necessary pulse energy adjustment for different z positions in the glass volume is compensated via SLM aberration correction in the end. Furthermore, the spatial extend of the modified and etched area is investigated. In consequence, a simplified scan strategy and depth-independent processing parameters can be achieved for the selective laser induced etching process.

Authors 5

1. Martin Kratz Aachen Fraunhofer ILT—Institute for Laser Technology

   Fraunhofer Institute for Laser Technology · RWTH Aachen University

   Affiliation as printed

   Fraunhofer ILT - Institute for Laser Technology

   RWTH Aachen University LLT - Chair for Laser Technology

2. Lukas Rückle Aachen Fraunhofer ILT—Institute for Laser Technology

   Fraunhofer Institute for Laser Technology

   Affiliation as printed

   Fraunhofer ILT - Institute for Laser Technology

3. Christian Kalupka Aachen Fraunhofer ILT—Institute for Laser Technology

   Fraunhofer Institute for Laser Technology

   Affiliation as printed

   Fraunhofer ILT - Institute for Laser Technology

4. Martin Reininghaus Aachen Fraunhofer ILT—Institute for Laser Technology

   Fraunhofer Institute for Laser Technology

   Affiliation as printed

   Fraunhofer ILT - Institute for Laser Technology

5. C. Haefner Aachen Fraunhofer ILT—Institute for Laser Technology

   Fraunhofer Institute for Laser Technology · RWTH Aachen University

   Affiliation as printed

   Fraunhofer ILT - Institute for Laser Technology

   RWTH Aachen University LLT - Chair for Laser Technology