Development of CVD technology for halide perovskite-based optoelectronics (Conference Presentation)

Abstract

Organic and inorganic halide perovskites have demonstrated rapid progress of optoelectronic figures-of-merit, strongly supporting their application in electroluminescent devices, photovoltaics as well as X-ray and optical detectors. However, the lack of a mature fabrication technology is a major challenge for their commercialization. Chemical vapor deposition (CVD) is an appealing choice due to its flexibility/scalability, high purity and superior process control. In this work, we present a prototype perovskite hot-wall CVD reactor, including details of powder-based sublimation sources, reactor design as well as selected results from deposited perovskite compounds, first optoelectronic devices and remaining challenges.

Authors 4

1. M. Heuken Aachen

   Aixtron (Germany) · RWTH Aachen University

   Affiliation as printed

   AIXTRON SE (Germany)

   RWTH Aachen Univ. (Germany)

2. Jona Riedel Aachen

   RWTH Aachen University

   Affiliation as printed

   RWTH Aachen Univ. (Germany)

3. Andrei Vescan Aachen

   RWTH Aachen University

   Affiliation as printed

   RWTH Aachen Univ. (Germany)

4. H. Kalisch Aachen

   RWTH Aachen University

   Affiliation as printed

   RWTH Aachen Univ. (Germany)