Multilayered Atomic Relaxation in van der Waals Heterostructures

Physical Review X, vol. 13

Abstract

When two-dimensional van der Waals materials are stacked to build heterostructures, moiré patterns emerge from twisted interfaces or from a mismatch in the lattice constant of individual layers.Relaxation of the atomic positions is a direct, generic consequence of the moiré pattern, with many implications for the physical properties.Moiré-driven atomic relaxation may be naively thought to be restricted to the interfacial layers and thus irrelevant for multilayered heterostructures.However, we provide experimental evidence for the importance of the three-dimensional nature of the relaxation in two types of van der Waals heterostructures: First, in multilayer graphene twisted on graphite at small twist angles (θ ≈ 0.14°), we observe propagation of relaxation domains even beyond 18 graphene layers.Second, we show how for multilayer PdTe 2 on Bi 2 Se 3 the moiré lattice constant depends on the number of PdTe 2 layers.Motivated by the experimental findings, we develop a continuum approach to model multilayered relaxation processes based on the generalized stacking fault energy functional given by ab initio simulations.Leveraging the continuum property of the approach enables us to access large-scale regimes and achieve agreement with our experimental data for both systems.Furthermore, it is well known that the electronic structure of graphene sensitively depends on local lattice deformations.Therefore, we study the impact of multilayered relaxation on the local density of states of the twisted graphitic system.We identify measurable implications for the system, experimentally accessible by scanning tunneling microscopy.Our multilayered relaxation approach is not restricted to the discussed systems and can be used to uncover the impact of an interfacial defect on various layered systems of interest.

Authors 9

1. Dorri Halbertal

   Columbia University

   Affiliation as printed

   Department of Physics, Columbia University, New York, New York 10027, USA

2. Lennart Klebl Aachen Institut für Theorie der Statistischen Physik

   Jülich Aachen Research Alliance · RWTH Aachen University

   Affiliation as printed

   Institut für Theorie der Statistischen Physik, RWTH Aachen University and JARA-Fundamentals of Future Information Technology, 52056 Aachen, Germany

3. Valerie Hsieh

   Columbia University

   Affiliation as printed

   Department of Physics, Columbia University, New York, New York 10027, USA

4. Jacob Cook

   University of Missouri

   Affiliation as printed

   Department of Physics and Astronomy, University of Missouri, Columbia, Missouri 65211, USA

5. Stephen Carr

   Brown University

   Affiliation as printed

   Physics Department, Brown University, Providence, Rhode Island 02912, USA

6. Guang Bian

   University of Missouri

   Affiliation as printed

   Department of Physics and Astronomy, University of Missouri, Columbia, Missouri 65211, USA

7. Cory R. Dean

   Columbia University

   Affiliation as printed

   Department of Physics, Columbia University, New York, New York 10027, USA

8. Dante Marvin Kennes Aachen Institut für Theorie der Statistischen Physik

   Jülich Aachen Research Alliance · Center for Free-Electron Laser Science · Max Planck Institute for the Structure and Dynamics of Matter · RWTH Aachen University

   Affiliation as printed

   Institut für Theorie der Statistischen Physik, RWTH Aachen University and JARA-Fundamentals of Future Information Technology, 52056 Aachen, Germany

   Max Planck Institute for the Structure and Dynamics of Matter, Center for Free Electron Laser Science, 22761 Hamburg, Germany

9. D. N. Basov

   Columbia University

   Affiliation as printed

   Department of Physics, Columbia University, New York, New York 10027, USA