Platinum substrate for surface plasmon microscopy at small angles

Optics Letters, vol. 45, pp. 3292

Abstract

Platinum is reported as the main component of the substrate in surface plasmon microscopy of the metal-dielectric interface for small-angle measurements. In the absence of a narrow dip in the angular spectrum of platinum, the refractive index of the dielectric medium or the thickness of a deposited layer is proven deducible from the observed sharp peak, close to the critical angle. The sensitivities of refractive index and thickness measurements using platinum are compared with that of a gold surface plasmon resonance chip. Furthermore, the thickness of a structured layer of (3-Aminopropyl)triethoxysilane on the platinum substrate is measured to be 0.7 nm, demonstrating the high sensitivity of the technique.

Authors 5

1. Hossein Hassani corresponding Aachen I. Institute of Physics (IA)

   Forschungszentrum Jülich · RWTH Aachen University

   Affiliation as printed

   Forschungszentrum Jülich GmbH, Institute of Biological Information Processing, Bioelectronics (IBI-3), Jülich, Germany

   RWTH Aachen University, I. Institute of Physics (IA), Aachen, Germany

2. Nikolaus Radja Wolf corresponding

   Forschungszentrum Jülich

   Affiliation as printed

   Forschungszentrum Jülich GmbH, Institute of Biological Information Processing, Bioelectronics (IBI-3), Jülich, Germany

3. Xiaobo Yuan corresponding

   Forschungszentrum Jülich

   Affiliation as printed

   Forschungszentrum Jülich GmbH, Institute of Biological Information Processing, Bioelectronics (IBI-3), Jülich, Germany

4. Roger Wördenweber corresponding

   Forschungszentrum Jülich

   Affiliation as printed

   Forschungszentrum Jülich GmbH, Institute of Biological Information Processing, Bioelectronics (IBI-3), Jülich, Germany

5. Andreas Offenhäusser corresponding Aachen I. Institute of Physics (IA)

   Forschungszentrum Jülich · RWTH Aachen University

   Affiliation as printed

   Forschungszentrum Jülich GmbH, Institute of Biological Information Processing, Bioelectronics (IBI-3), Jülich, Germany

   RWTH Aachen University, I. Institute of Physics (IA), Aachen, Germany