September 30, 2010 article Low Damage and Anisotropic Dry Etching of High-k Dielectric HfO2 Films in Inductively Coupled Plasmas Electronic Materials Letters DOI: 10.3365/eml.2010.09.107 OpenAlex Authors 0 Author list not loaded yet. Cited by 1 stored of 11 Search Sort Most cited Newest Oldest Patent citations Title Any typearticle review book-chapter conference-paper preprint dissertation book dataset other Any fieldAgricultural and Biological Sciences Arts and Humanities Biochemistry, Genetics and Molecular Biology Business, Management and Accounting Chemical Engineering Chemistry Computer Science Decision Sciences Dentistry Earth and Planetary Sciences Economics, Econometrics and Finance Energy Engineering Environmental Science Health Professions Immunology and Microbiology Materials Science Mathematics Medicine Neuroscience Nursing Pharmacology, Toxicology and Pharmaceutics Physics and Astronomy Psychology Social Sciences Veterinary Open access Mid-IR diffraction gratings fabricated via nanoimprint lithography for chirped pulse amplification 2026 Research Square preprint Materials Science Optical Coatings and Gratings Open access 0 citations 1 result References 0