Apparatus
Abstract
An apparatus 20 for processing a sample 38 comprises a chamber for containing a process gas, a vision, detection or radiation device 26a, 26b, 26c and at least one solid barrier member 28a, 28b, 30a, 30b. The apparatus may be a chemical vapour deposition apparatus and is suitable for performing a film coating process. The solid barrier member acts to break or disrupt a convective vortex of the process gas into a plurality of smaller convective vortices 50 to increase a convective flow path of the gas. Exposure of the device to heat transported by the gas and material deposited by the gas is reduced. A cooling device, preferably a heat sink or coolant conduit, may be provided to cool the barrier member. The barrier member preferably includes at least one protruding member projecting from a wall of the chamber into the interior space. The device may be a light source, an x-ray source, an electromagnetic radiation detector, an electron or ion beam source, a particle radiation detector, a window or a scanning probe.
Inventors 5
- Gertjan, Van Baarle
- Irene, Groot
- Mehdi, Saedi
- Arthur, Sjardin
- Marc, De Voogd
Inventors are linked to an Aachen author when surname and first name match exactly one author.
Applicants
- Leiden Probe Microscopy B.V GBS Leiden
Cited papers 0 in the database
No literature citations.